Vistec Lithography’s (previously Leica
Microsystems) VB300 e-beam lithography tool
is a development of the highly successful
VB6 series introduced in 1993. In designing
the new tool, Vistec identified that a reduction
of noise-induced positional errors would
significantly improve tool performance.
Through a combination of improved
mechanical rigidity and integration of the
Renishaw RLE20 differential interferometer
based encoder system, these errors are now
expected to be <3 nm.
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