Press release: RLE20 interferometer enhances performance of Vistec Lithography’s latest e-beam tool (doc)

File size: 34 kB Language: English Part number: H-5225-0724

Press release: RLE20 interferometer enhances performance of Vistec Lithography’s latest e-beam tool

Vistec Lithography’s (previously Leica Microsystems) VB300 e-beam lithography tool is a development of the highly successful VB6 series introduced in 1993. In designing the new tool, Vistec identified that a reduction of noise-induced positional errors would significantly improve tool performance. Through a combination of improved mechanical rigidity and integration of the Renishaw RLE20 differential interferometer based encoder system, these errors are now expected to be <3 nm.

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